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https://www.zhiyuematerial.com/blog/applications-and-advantages-of-aluminum-oxide-sputtering-target.html

What is Aluminum Oxide Sputtering Target?
Aluminum oxide sputtering target, commonly known as alumina, is a versatile material widely used in the field of thin film deposition. It is a ceramic material with excellent thermal, electrical, and mechanical properties, making it ideal for various sputtering applications. The sputtering process involves bombarding the target material with high-energy ions to release atoms that form a thin film on the substrate.